Complete Optical Characterization of Non-Uniform SiOx Thin Films Using Imaging Spectroscopic Reflectometry

Precise Measurement of Thickness Distribution of Non- Uniform Thin Films by Imaging Spectroscopic Reflectometry

− A new method of imaging spectroscopic photometry enabling us to perform the complete optical characterization of thin films exhibiting area non-uniformity in optical parameters is presented. An original imaging spectroscopic photometer operating in the reflection mode at normal incidence is used to apply this method. A CCD camera serves as a detector in this photometer. Therefore the spectral...

OPTICAL ANALYSIS OF ZnO THIN FILMS USING SPECTROSCOPIC ELLIPSOMETRY AND REFLECTOMETRY

Electronic state characterization of SiOx thin films prepared by evaporation

SiOx thin films with different stoichiometries from SiO1.3 to SiO1.8 have been prepared by evaporation of silicon monoxide in vacuum or under well-controlled partial pressures of oxygen sP,10−6 Torrd. These thin films have been characterized by x-ray photoemission and x-ray-absorption spectroscopies, this latter at the Si K and L2,3 absorption edges. It has been found that the films prepared in...

Optical Monitoring of Thin-films Using Spectroscopic Ellipsometry

Spectroscopic Ellipsometry (SE) offers a precise technique for measuring thin film properties. Advanced SE instrumentation has been demonstrated as an excellent technique for monitoring the growth of optical films for sputtering applications. We have recently extended this technique for PVD E-gun evaporated films. In this paper we will show how an SE system was integrated into a standard optica...

Structural, Electrical and Optical Properties of Molybdenum Oxide Thin Films Prepared by Post-annealing of Mo Thin Films

Molybdenum thin films with 50 and 150 nm thicknesses were deposited on silicon substrates, using DC magnetron sputtering system, then post-annealed at different temperatures (200, 325, 450, 575 and 700°C) with flow oxygen at 200 sccm (standard Cubic centimeter per minute). The crystallographic structure of the films was obtained by means of x-ray diffraction (XRD) analysis. An atomic force micr...